ПОЛУЧЕНИЕ ПЛЕНОК AlN/AL НА Si МЕТОДОМ ИМПУЛЬСНОГО МАГНЕТРОННОГО РАСПЫЛЕНИЯ ДЛЯ АКТИВНОГО СЛОЯ ОАВ-РЕЗОНАТОРОВ
ПОЛУЧЕНИЕ ПЛЕНОК AlN/AL НА Si МЕТОДОМ ИМПУЛЬСНОГО МАГНЕТРОННОГО РАСПЫЛЕНИЯ ДЛЯ АКТИВНОГО СЛОЯ ОАВ-РЕЗОНАТОРОВ
Богословцева Алёна Леонидовна, младший научный сотрудник НГУ, e-mail: a.bogoslovtseva@g.nsu.ru.
Капишников Александр Владимирович, научный сотрудник НГУ, e-mail: a.kapishnikov@g.nsu.ru.
Гейдт Павел Викторович, канд. физ.-мат. наук, заведующий лабораторией НГУ, e-mail: p.geydt@ g.nsu.ru.
1. Iqbal A., Mohd-Yasin F. Reactive sputtering of aluminum nitride (002) thin films for piezoelectric applications: A review // Sensors. 2018. Vol. 18 (6), p. 1797.
2. Advances in piezoelectric thin films for acoustic biosensors, acoustofluidics and lab-on-chip applications / Y. Q. Fu [et al.] // Progress in Materials Science. 2017. Vol. 89, pp. 31–91.
3. Haider S. T., Shah M. A., Lee D. G., Hur S. A Review of the Recent Applications of Aluminum Nitride-based Piezoelectric Devices // IEEE Access. 2023. Vol. 11, pp. 58779–58795.
4. Торгаш Т. Н., Козлов А. Г., Чириков Н. А. Исследование влияния температуры на частотные характеристики микроэлектронного ОАВ-резонатора с брэгговским отражателем // Техника радиосвязи. 2022. Выпуск 2 (53). С. 111–117.
5. Li C., Liu X., Shu L., Li Y. AlN-based surface acoustic wave resonators for temperature sensing applications // Materials Express. 2015. Vol. 5 (4), pp. 367–370.
6. AlN piezoelectric thin films for energy harvesting and acoustic devices / C. Fei [et al.] // Nano Energy. 2018. Vol. 51, pp. 146–161.
7. Novel SAW Temperature Sensor with Pt/Ti/AlN/Mo/AlN/Si Structure for High Temperature Application / Y. Ruan [et al.] // Chemosensors. 2023. Vol. 11 (4), p. 225.
8. Kamohara T., Akiyama M., Kuwano N. Influence of molybdenum bottom electrodes on crystal growth of aluminum nitride thin films // Journal of crystal growth. 2008. Vol. 310 (2), pp. 345–350.
9. Imran S., Yuan J., Yin G., Ma Y., He S. Influence of metal electrodes on c‐axis orientation of AlN thin films deposited by DC magnetron sputtering //Surface and Interface Analysis. 2017. Vol. 49 (9), pp. 885–891.
10. Structure evolution and mechanical properties enhancement of Al/AlN multilayer /
G. A. Zhang [et al.] // Applied Surface Science. 2007. Vol. 253 (22), pp. 8835–8840.
11. Structure and mechanical properties of Al/AlN multilayer with different AlN layer thickness / Z. G. Wu [et al.] // Applied Surface Science. 2006. Vol. 253 (5), pp. 2733–2738.
12. Evaluation of the interface stability of Al/AlN multilayered composites under thermal stress / M. Wang [et al.] // Surface and Coatings Technology. 2021. Vol. 414, p. 127117.
13. Deposition of c-axis orientation aluminum nitride films on flexible polymer substrates by reactive direct-current magnetron sputtering / H. Jin [et al.] // Thin Solid Films. 2012. Vol. 520 (15), pp. 4863–4870.
14. DC sputtering of highly c-axis AlN films on top of 3C-SiC (111)-on-Si (111) substrates under various N2 concentrations / A. Iqbal [et al.] // Journal of Vacuum Science & Technology B. 2017. Vol. 35 (6).
15. Synthesis of c-axis-oriented AlN thin films on high-conducting layers: Al, Mo, Ti, TiN, and Ni / G. F. Iriarte [et al.] // IEEE transactions on ultrasonics, ferroelectrics, and frequency control. 2005. Vol. 52 (7), pp. 1170–1174.
16. Comparative study of c-axis AlN films sputtered on metallic surfaces / A. Sanz-Hervas [et al.] // Diamond and related materials. 2005. Vol. 14 (3-7), pp. 1198–1202.
17. Dubois M. A., Muralt P. Stress and piezoelectric properties of aluminum nitride thin films deposited onto metal electrodes by pulsed direct current reactive sputtering // Journal of Applied Physics. 2001. Vol. 89 (11), pp. 6389–6395.
18. Chemical Composition, Structure, and Physical Properties of AlN Films Produced via Pulsed DC Reactive Magnetron Sputtering / V. R. Shayapov [et al.] // Coatings. 2023. Vol. 13 (7), p. 1281.
19. Wide Bandwidth Bragg Mirrors for Multi-band Filter Chips / J. Olivares [et al.] // IEEE Ultrasonics Symposium. 2009. Pp. 2119–2122.
20. Kubart T., Aijaz A. Evolution of sputtering target surface composition in reactive high power impulse magnetron sputtering // Journal of Applied Physics. 2017. Vol. 121 (17).
21. Zolotoyabko E. Determination of the degree of preferred orientation within the March–Dollase approach // Journal of applied Crystallography. 2009. Vol. 42 (3), pp. 513–518.
22. Давлеткильдеев Н. А., Мосур Е. Ю., Никифорова А. О. Изучение пьезоэлектрических свойств ниобата лития методом сканирующей силовой микроскопии пьезоотклика // Техника радиосвязи. 2022. Выпуск 4 (55). С. 83–90.
23. Petrov I., Barna P. B., Hultman L., Greene J. E. Microstructural evolution during film growth // Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 2003. Vol. 21 (5), S117–S128.
24. Mwema F. M., Oladijo O. P., Akinlabi S. A., Akinlabi E. T. Properties of physically deposited thin aluminium film coatings: A review // Journal of alloys and compounds. 2018. Vol. 747, pp. 306–323.